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Physics

Clean Room Facility for Semiconductor Processing and Device Fabrication

The Department of Physics and Electronic Engineering maintains a semiconductor processing facility, which is available to research groups in the university and also by arrangement to outside organisations. For further information contact Dr. David Inglis.

This clean room facility meets Class 35 (American Class 100) requirements for semiconductor processing and device fabrication. The room is sealed, air entering the clean room through High Efficiency Particulate Air ( HEPA ) filters, and is maintained at 60Pa above ambient pressure. The room contains essential fabrication and testing equipment while air compressors, water purifiers, and gas supplies are located outside the clean room.

Clean Room: 9850 7753       Gowning Room: 9850 7752

Equipment Manuals:
Tencor Profilometer
Karl Suss MJB3 mask aligner
Plasma Etcher

Software, in E7B 233:
Tanner EDA design tools including L-Edit for Mask layout
COMSOL Multiphysics, finite element analysis package (formerly FEMLAB)

Forms: The first two forms must be filled out by all new users of a chemical.
Hazardous Substance Risk assesment
Experiment/Task/Process Risk Assessment
Hazardous Substance Declaration
Material Safety Data Sheets, MSDS
  1. Change room
  2. Tencor profilometer
  3. Vacuum deposition system
  4. Wet chemical bench
  5. Millipore ultra-pure water system
  6. Headway resist spinner
  7. Wentworth hotplates
  8. Karl Suss MJB3 mask aligner
  9. Plasma etcher and scribe
  10. Polyvar microscope
  11. Gas and compressed air supplies

Microfluidic devices fabricated by David Inglis
in the clean room facility.

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